CPC C23C 14/3407 (2013.01) [C23C 14/021 (2013.01); C23C 14/08 (2013.01); C23C 14/165 (2013.01); C23C 14/185 (2013.01); C23C 14/35 (2013.01); C23C 14/505 (2013.01); C23C 14/5853 (2013.01); C25B 9/50 (2021.01); C25B 11/053 (2021.01); C25B 11/091 (2021.01)] | 10 Claims |
1. A method for preparing a bismuth oxide nanowire film by heating in an upside down position, wherein a chemical formula of bismuth oxide is Bi2O3, and the method comprises:
washing a substrate, and fixing the substrate to a substrate support in a magnetron sputtering system in a position, wherein an electrically conductive surface of the substrate faces downwards in the position;
placing a bismuth target on a sputtering head in the magnetron sputtering system, wherein the bismuth target is adhered to a copper backing plate;
performing direct current magnetron sputtering to form a bismuth film on the electrically conductive surface of the substrate; and
regulating a heating temperature to maintain the bismuth film in a semi-molten state, and providing a predetermined oxygen gas concentration to form the bismuth oxide nanowire film.
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