CPC C23C 14/34 (2013.01) [C23C 14/505 (2013.01)] | 14 Claims |
1. A sputter deposition system for depositing at least one film on one or more substrates, the sputter deposition system comprising:
a sputter chamber equipped with a rotatable substrate holder for holding the one or more substrates,
wherein:
the rotatable substrate holder is configured to hold the one or more substrates and to allow rotation of the one or more substrates around their own axis and around a rotation axis of the rotatable substrate holder;
the rotatable substrate holder comprises a bearing assembly comprising an outer ring and an inner ring; and
the bearing assembly is configured so that the one or more substrates are bearing or bearings of the bearing assembly.
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