US 12,233,433 B2
Uniform thin film deposition for poly-p-xylylene
Amanda Rickman, Garland, TX (US); and James R. Smith, Princeton, TX (US)
Assigned to RAYTHEON COMPANY, Waltham, MA (US)
Filed by RAYTHEON COMPANY, Waltham, MA (US)
Filed on Apr. 27, 2018, as Appl. No. 15/964,959.
Prior Publication US 2019/0329286 A1, Oct. 31, 2019
Int. Cl. B05D 1/00 (2006.01); C23C 16/46 (2006.01)
CPC B05D 1/60 (2013.01) [C23C 16/46 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A deposition chamber for forming a poly-para-xylylene film, the deposition chamber comprising:
a chamber body;
an inlet coupling the chamber body to a furnace containing a poly-para-xylylene precursor monomer;
an outlet coupling the chamber body to a vacuum pump;
a heater mounted directly on an exterior outside surface of the chamber body, the heater configured to raise an internal temperature of an entire internal volume of the chamber body to a substantially uniform internal temperature across the entire internal volume of the chamber body; and
a plurality of shelves arranged within an interior inside surface of the chamber body, each shelf of the plurality of shelves being a horizontal surface for holding a plurality of objects onto which the poly-para-xylylene film is deposited, each shelf extending continuously from a first interior surface to a second interior surface of the chamber body, and the horizontal surfaces stacked in a vertical arrangement and in parallel to one another.