US 11,910,594 B2
Semiconductor devices and methods of manufacturing the same
Yanghee Lee, Incheon (KR); Jonghyuk Park, Hwaseong-si (KR); Ilyoung Yoon, Hwaseong-si (KR); Boun Yoon, Seoul (KR); and Heesook Cheon, Seoul (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Jul. 7, 2022, as Appl. No. 17/859,247.
Application 17/859,247 is a continuation of application No. 16/903,040, filed on Jun. 16, 2020, granted, now 11,411,004.
Claims priority of application No. 10-2019-0136634 (KR), filed on Oct. 30, 2019.
Prior Publication US 2022/0344345 A1, Oct. 27, 2022
Int. Cl. H10B 12/00 (2023.01)
CPC H10B 12/37 (2023.02) [H10B 12/0387 (2023.02); H10B 12/482 (2023.02); H10B 12/50 (2023.02)] 20 Claims
OG exemplary drawing
 
1. A semiconductor device comprising:
a substrate including:
a chip region; and
a scribe lane region surrounding the chip region;
a bit line structure on the chip region of the substrate, the bit line structure having a stacked structure including multiple layers stacked on each other;
a first spacer structure on a sidewall of the bit line structure;
a key structure on the scribe lane region of the substrate, the key structure having the same stacked structure as the bit line structure;
a second spacer structure on a sidewall of the key structure;
a filling pattern on the scribe lane region of the substrate, the filling pattern being adjacent to the second spacer structure and including a conductive material; and
a first conductive structure on the filling pattern, the key structure and the second spacer structure.