US 11,907,007 B2
Clock signal distribution system, integrated circuit device and method
Jerry Chang Jui Kao, Hsinchu (TW); Huang-Yu Chen, Hsinchu (TW); Sheng-Hsiung Chen, Hsinchu (TW); Jack Liu, Hsinchu (TW); Yung-Chen Chien, Hsinchu (TW); Wei-Hsiang Ma, Hsinchu (TW); and Chung-Hsing Wang, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on Jan. 4, 2021, as Appl. No. 17/140,399.
Prior Publication US 2022/0214712 A1, Jul. 7, 2022
Int. Cl. G06F 1/10 (2006.01); G06F 30/396 (2020.01)
CPC G06F 1/10 (2013.01) [G06F 30/396 (2020.01)] 20 Claims
OG exemplary drawing
 
1. A clock distribution system, comprising:
a clock mesh structure comprising:
a plurality of first metal patterns extending along a first axis,
a plurality of second metal patterns extending along a second axis, and
a plurality of third metal patterns extending along a third axis,
wherein
the plurality of first metal patterns, the plurality of second metal patterns, and the plurality of third metal patterns are electrically coupled with each other,
the second axis is transverse to the first axis,
the third axis is oblique to both the first axis and the second axis,
the plurality of first metal patterns comprises a main first metal pattern, and other first metal patterns different from the main first metal pattern,
the plurality of second metal patterns comprises a main second metal pattern, and other second metal patterns different from the main second metal pattern,
the plurality of third metal patterns comprises a main third metal pattern,
the main first metal pattern overlaps the main second metal pattern and the main third metal pattern, without overlapping the other second metal patterns, and
the main third metal pattern overlaps the main second metal pattern, one or more of the other first metal patterns, and one or more of the other second metal patterns.