US 11,906,904 B2
Projection exposure method and projection lens with setting of the pupil transmission
Toralf Gruner, Aalen-Hofen (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on Oct. 7, 2021, as Appl. No. 17/496,083.
Application 17/496,083 is a continuation of application No. 16/681,348, filed on Nov. 12, 2019, granted, now 11,143,967, issued on Oct. 12, 2021.
Application 16/681,348 is a continuation of application No. PCT/EP2018/062201, filed on May 11, 2018.
Claims priority of application No. 102017208340.9 (DE), filed on May 17, 2017.
Prior Publication US 2022/0026814 A1, Jan. 27, 2022
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01); G02B 5/18 (2006.01); G02B 5/20 (2006.01)
CPC G03F 7/70308 (2013.01) [G03F 7/70266 (2013.01); G03F 7/70316 (2013.01); G02B 5/18 (2013.01); G02B 5/20 (2013.01)] 27 Claims
OG exemplary drawing
 
1. A system, comprising:
a projection lens comprising a plurality of optical elements in a beam path of a working wavelength of electromagnetic radiation to image a pattern arranged in an object surface of the projection lens into an image surface of the projection lens via the operating wavelength of the electromagnetic radiation, the plurality of optical elements comprising a replaceable optical element;
a correction optical element; and
an interchange device configured to replace the replaceable optical element with the correction optical element,
wherein:
the correction optical element comprises a body comprising a surface which comprises regions consisting of diffraction structures configured to diffract an operating wavelength of electromagnetic radiation;
the regions of the surface of the correction element consist of diffraction structures comprise a first region of the surface of the correction element and a second region of the surface of the correction element;
the first region of the surface of the correction element consists of first diffraction structures having a first density of diffraction structures;
the second region of the surface of the correction element consists of second diffraction structures having a second density of diffraction structures;
the second density of diffraction structures is different from the first density of diffraction structures; and
the operating wavelength of the electromagnetic radiation is in the DUV range.