US 11,906,900 B2
Chemically amplified positive photoresist composition for improving pattern profile
Su Jin Lee, Daegu (KR); Young Cheol Choi, Gumin-si (KR); Seung Hun Lee, Daegu (KR); and Seung Hyun Lee, Daegu (KR)
Assigned to YOUNG CHANG CHEMICAL CO., LTD, Gyeongsangbuk-do (KR)
Appl. No. 15/734,140
Filed by YOUNG CHANG CHEMICAL CO., LTD, Gyeongsangbuk-do (KR)
PCT Filed May 22, 2019, PCT No. PCT/KR2019/006128
§ 371(c)(1), (2) Date Dec. 1, 2020,
PCT Pub. No. WO2019/245172, PCT Pub. Date Dec. 26, 2019.
Claims priority of application No. 10-2018-0069664 (KR), filed on Jun. 18, 2018.
Prior Publication US 2021/0216013 A1, Jul. 15, 2021
Int. Cl. G03F 7/039 (2006.01); G03F 7/004 (2006.01)
CPC G03F 7/0392 (2013.01) [G03F 7/0045 (2013.01)] 4 Claims
 
1. A chemically amplified positive photoresist composition for improving a pattern profile, suitable for use in a photoresist enabling exposure using a light source having a wavelength of 248 nm, comprising, based on a total weight of the composition, 5 to 60 wt % of a polymer resin, 0.1 to 10 wt % of a transmittance-increasing resin additive consisting of Chemical Formula 1 below, 0.05 to 10 wt % of a photoacid generator, 0.01 to 5 wt % of an acid diffusion inhibitor, and a remainder of a solvent:

OG Complex Work Unit Chemistry
wherein a, b, c, and d are molar ratios of repeating units constituting a copolymer and are each 1 to 9, in which R1, R2, and R3 are at least one selected from among methyl (R—CH3), ethyl (R—CH2CH3), propyl (R—CH2CH2CH3), butyl (R—CH2CH2CH2CH3) and combinations thereof, and are different from each other, R being a binding site, and
wherein the polymer resin is at least one selected from the group consisting of hydroxyl-group-containing phenol polymer resins represented by Chemical Formula 2 to Chemical Formula 5 below:
[Chemical Formula 2]
resin comprising

OG Complex Work Unit Chemistry
repeating units,
wherein R4 is any one structure selected from among structures represented by Chemical Formula a to Chemical Formula p below, and R is a binding site,

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry
[Chemical Formula 3]
resin comprising

OG Complex Work Unit Chemistry
repeating units,
wherein R5 is identical to R4 and is any one structure selected from among structures represented by Chemical Formula a to Chemical Formula p,
[Chemical Formula 4]
resin comprising

OG Complex Work Unit Chemistry
repeating units,
wherein R6 and R7 are one or more structures selected from among structures represented by Chemical Formula a to Chemical Formula p, and
[Chemical Formula 5]
resin comprising

OG Complex Work Unit Chemistry
repeating units,
wherein R8 and R9 are one or more structures selected from among structures represented by Chemical Formula a to Chemical Formula p.