CPC G03F 1/24 (2013.01) [G03F 1/26 (2013.01); G03F 1/80 (2013.01); G03F 1/84 (2013.01); G03F 7/70433 (2013.01); G03F 7/70466 (2013.01); H01L 21/2633 (2013.01)] | 20 Claims |
1. A reflective mask, comprising:
a substrate; and
a first stack of multiple layers disposed over the substrate and comprising:
a first reflective multilayer over the substrate,
a first capping layer over the first reflective multilayer,
a first absorber layer over the first capping layer, wherein the first absorber layer includes a first material and comprises a top surface, and
a first protection layer disposed directly on the top surface of the first absorber layer and includes a second material,
wherein a ratio of nitrogen to tantalum (N/Ta) in the first protection layer is greater than or equal to 1.25.
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