US 11,906,853 B2
Display panel and display device
Xue Dong, Beijing (CN); Liwei Liu, Beijing (CN); Xinxing Wang, Beijing (CN); Yun Sik Im, Beijing (CN); Hyun Sic Choi, Beijing (CN); Jaegeon You, Beijing (CN); Yinglong Huang, Beijing (CN); and Heecheol Kim, Beijing (CN)
Assigned to BOE Technology Group Co., Ltd., Beijing (CN)
Filed by BOE Technology Group Co., Ltd., Beijing (CN)
Filed on Oct. 19, 2022, as Appl. No. 17/968,963.
Application 17/968,963 is a continuation of application No. 16/335,862, granted, now 11,480,830, previously published as PCT/CN2018/104398, filed on Sep. 6, 2018.
Claims priority of application No. 201711353502.2 (CN), filed on Dec. 15, 2017.
Prior Publication US 2023/0042708 A1, Feb. 9, 2023
Int. Cl. G02F 1/133 (2006.01); G02F 1/1339 (2006.01); G02F 1/1335 (2006.01); G02F 1/1362 (2006.01); G02F 1/1368 (2006.01); H01L 27/12 (2006.01)
CPC G02F 1/13394 (2013.01) [G02F 1/1368 (2013.01); G02F 1/13396 (2021.01); G02F 1/133512 (2013.01); G02F 1/136286 (2013.01); H01L 27/124 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A display panel, comprising:
a first substrate;
a second substrate provided oppositely to the first substrate; and
a plurality of subpixel units arranged in an array, wherein
a plurality of main spacers and a plurality of auxiliary spacers are provided on a side of the first substrate close to the second substrate; the second substrate further includes a plurality of first lug bosses and a plurality of second lug bosses; an orthographic projection of each of the main spacers on the second substrate is at least partially overlapped with an orthographic projection of a corresponding first lug boss on the second substrate; an orthographic projection of at least one of the auxiliary spacers on the second substrate is at least partly overlapped with an orthographic projection of a corresponding second lug boss on the second substrate;
a distance between each of the auxiliary spacers and the corresponding second lug boss in a direction perpendicular to the second substrate is less than a height of each of the first lug bosses in the direction perpendicular to the second substrate;
the plurality of auxiliary spacers include at least two auxiliary spacers, the at least two auxiliary spacers are deviated from the corresponding second lug bosses by different offset distances along an extension direction of an offset straight line parallel to the second substrate;
wherein along a first line parallel to the second substrate, centers of orthographic projections of the at least two auxiliary spacers on the second substrate are spaced apart from centers of orthographic projections of the corresponding second lug bosses on the second substrate by different preset distances, and the first line is parallel to one of extension directions of the plurality of subpixel units; and
wherein a distance from each of the at least two auxiliary spacers to the corresponding second lug boss in the direction perpendicular to the second substrate is not zero.