US 11,905,594 B2
Chemical vapor deposition process for producing diamond
Neil Fox, Bristol (GB); Hugo Dominguez Andrade, Bristol (GB); Thomas B Scott, Bristol (GB); Edward JD Mahoney, Bristol (GB); and Alexander Croot, Bristol (GB)
Assigned to The University of Bristol, Bristol (GB)
Appl. No. 17/639,490
Filed by The University of Bristol, Bristol (GB)
PCT Filed Sep. 2, 2020, PCT No. PCT/GB2020/052101
§ 371(c)(1), (2) Date Mar. 1, 2022,
PCT Pub. No. WO2021/044140, PCT Pub. Date Mar. 11, 2021.
Claims priority of application No. 1912659 (GB), filed on Sep. 3, 2019.
Prior Publication US 2022/0325406 A1, Oct. 13, 2022
Int. Cl. C23C 16/27 (2006.01); C23C 16/52 (2006.01)
CPC C23C 16/274 (2013.01) [C23C 16/272 (2013.01); C23C 16/277 (2013.01); C23C 16/52 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A chemical vapor deposition (CVD) process for producing diamond, the process comprising:
providing a CVD growth chamber containing a growth substrate;
charging the CVD growth chamber with a gas mixture, the gas mixture comprising a carbon source gas;
activating the gas mixture to facilitate growth of diamond on the growth substrate; and
providing for a period of diamond growth during which the gas mixture is sealed within the CVD growth chamber.