US 12,232,424 B2
Fatigue-free bipolar loop treatment to reduce imprint effect in piezoelectric device
Chi-Yuan Shih, Hsinchu (TW); Shih-Fen Huang, Jhubei (TW); You-Ru Lin, New Taipei (TW); and Yan-Jie Liao, Hsinchu (TW)
Assigned to Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu (TW)
Filed on Nov. 20, 2023, as Appl. No. 18/513,918.
Application 18/513,918 is a continuation of application No. 17/874,446, filed on Jul. 27, 2022, granted, now 11,856,862.
Application 17/874,446 is a continuation of application No. 16/534,330, filed on Aug. 7, 2019, granted, now 11,456,330, issued on Sep. 27, 2022.
Prior Publication US 2024/0099147 A1, Mar. 21, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. H10N 30/20 (2023.01); H10N 30/074 (2023.01); H10N 39/00 (2023.01)
CPC H10N 39/00 (2023.02) [H10N 30/074 (2023.02); H10N 30/206 (2023.02)] 20 Claims
OG exemplary drawing
 
1. A method, comprising:
applying a first set of signal pulses to a piezoelectric device over a first time period;
during the first time period, determining whether a parameter of the piezoelectric device deviates from a reference value by more than a predetermined value; and
based on whether the parameter deviates from the reference value by more than the predetermined value, selectively applying a second set of signal pulses to the piezoelectric device over a second time period, the second time period being after the first time period and second set of signal pulses differing in magnitude and/or polarity from the first set of signal pulses.