CPC H01L 27/1462 (2013.01) [H01L 27/14621 (2013.01); H01L 27/1464 (2013.01)] | 20 Claims |
1. Image sensor comprising a plurality of pixels, each comprising:
a semiconductor photodetector region;
a metal region arranged on a first surface of the semiconductor region;
a band-pass or band-stop interference filter arranged on a second surface of the semiconductor region opposite to the first surface; and
between the semiconductor region and the metal region, an absorbing stack comprising, in the order from the semiconductor region, a dielectric layer, a silicon layer, and a tungsten layer;
wherein the tungsten layer is in contact, at an upper surface, with a lower surface of the silicon layer.
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