| CPC H01L 27/1262 (2013.01) [G02F 1/133345 (2013.01); G02F 1/133512 (2013.01); G02F 1/1339 (2013.01); G02F 1/136213 (2013.01); G02F 1/1368 (2013.01); H01L 27/1218 (2013.01); H01L 27/1225 (2013.01); H01L 27/1255 (2013.01); H01L 29/78648 (2013.01); H10K 50/8426 (2023.02); H10K 50/8428 (2023.02); H10K 50/844 (2023.02); H10K 59/38 (2023.02); H10K 59/40 (2023.02); H10K 71/50 (2023.02); H10K 2102/00 (2023.02)] | 6 Claims |

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1. An electronic device comprising:
a first substrate;
a first adhesive layer provided on a first surface side of the first substrate;
a second substrate;
a second adhesive layer provided on a first surface side of the second substrate; and
an element layer provided between the first adhesive layer and the second adhesive layer,
wherein the element layer comprises:
a pixel portion; and
a peripheral circuit portion,
wherein the pixel portion comprises:
a first transistor;
a capacitor; and
a light-emitting element,
wherein the peripheral circuit portion comprises a second transistor,
wherein the electronic device further comprises:
a first conductive layer comprising a region configured to function as a gate electrode of the first transistor;
a second conductive layer comprising a region configured to function as a gate electrode of the second transistor;
a first insulating layer over and in contact with the first conductive layer and the second conductive layer;
a second insulating layer over the first insulating layer;
a first semiconductor layer over the second insulating layer, the first semiconductor layer comprising a channel formation region of the first transistor;
a second semiconductor layer over the second insulating layer, the second semiconductor layer comprising a channel formation region of the second transistor;
a third insulating layer over the first semiconductor layer and the second semiconductor layer; and
a fourth insulating layer over and in contact with the first semiconductor layer, the second semiconductor layer, and the second insulating layer,
wherein, in a plan view, in a region between an edge of the second substrate and the second transistor, the first insulating layer comprises a first region not overlapping with the second insulating layer,
wherein the first insulating layer comprises a second region overlapping with the first conductive layer,
wherein a thickness of the first region is thinner than a thickness of the second region, and
wherein the third insulating layer is in contact with the first region.
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