CPC H01L 25/50 (2013.01) [H01L 23/13 (2013.01); H01L 25/0657 (2013.01); H01L 25/18 (2013.01); H01L 23/147 (2013.01); H01L 23/15 (2013.01); H01L 24/32 (2013.01); H01L 24/33 (2013.01); H01L 24/73 (2013.01); H01L 2224/32145 (2013.01); H01L 2224/33181 (2013.01); H01L 2224/73215 (2013.01); H01L 2224/73265 (2013.01); H01L 2225/0651 (2013.01); H01L 2225/06548 (2013.01); H01L 2225/06562 (2013.01); H01L 2225/06586 (2013.01); H01L 2924/15153 (2013.01); H01L 2924/15738 (2013.01); H01L 2924/15787 (2013.01); H01L 2924/15788 (2013.01)] | 13 Claims |
1. A method for manufacturing a semiconductor device, the method comprising:
forming a plurality of recess portions on a first surface of a support, a first recess portion of the plurality of recess portions being between a plurality of protrusion portions on the first surface;
placing a stacked body into the first of the recess portion, the stacked body including a plurality of semiconductor chips;
filling the first recess portion with a resin layer, the resin layer covering the stacked body in the first recess portion;
irradiating a protrusion portion of the plurality of protrusion portions on the first surface of the support with a laser beam to form a modified portion in the protrusion portion;
dividing the support along the protrusion portion into separate pieces;
after placing the stacked body, forming a columnar electrode extending in a stacking direction of the stacked body on at least one of the semiconductor chips of the stacked body; and
after forming the modified portion, polishing the resin layer until an end of the columnar electrode is exposed.
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12. A method for manufacturing a semiconductor device, comprising:
forming a pattern of recess portions and protrusion portions in a support for semiconductor devices;
placing a stacked body in at least one of the recess portions, the stacked body comprising a plurality of stacked semiconductor chips;
forming a resin layer filling the recess portions;
irradiating at least one of the protrusion portions on the support with a laser beam to reduce a warpage of the support;
after placing the stacked body, forming a columnar electrode extending in a stacking direction of the stacked body on at least one of the semiconductor chips of the plurality of stacked semiconductor chips; and
after irradiating the at least one of the protrusion portions on the support, polishing the resin layer until an end of the columnar electrode is exposed.
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