| CPC H01L 21/6838 (2013.01) [C23C 16/45544 (2013.01); C23C 16/458 (2013.01); C23C 16/46 (2013.01); C23C 16/50 (2013.01); H01L 21/68735 (2013.01)] | 24 Claims |

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1. A susceptor for a processing chamber, the susceptor comprising:
a susceptor top surface;
a susceptor bottom surface;
a plurality of recesses in the susceptor top surface to support a plurality of wafers, the plurality of recesses positioned so that central axes of the plurality of wafers are offset from a central axis of the susceptor, when the wafers are supported by the recesses, each of the plurality of recesses having a bottom surface; and
for at least one of the plurality of recesses;
a passage connected with the at least one of the plurality of recesses and extending below the at least one of the plurality of recesses to the susceptor bottom surface,
a hole extending from a surface of the susceptor at a location outside of the at least one of the plurality of recesses to the passage, and
the hole configured to receive a plug that seals the hole.
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