CPC H01L 21/67109 (2013.01) [F27B 17/0025 (2013.01); F27D 7/02 (2013.01); F27D 99/0073 (2013.01); H01L 21/324 (2013.01); H01L 21/67253 (2013.01); H01L 22/20 (2013.01); F27D 5/0037 (2013.01); F27D 2019/0084 (2013.01)] | 15 Claims |
1. A substrate treating apparatus comprising:
a process chamber having a first body and a second body which are combined with each other to have a treatment space therein;
a support unit located inside the treatment space and supporting a substrate;
a heating unit configured to heat the substrate placed on the support unit;
a driver configured to move any one of the first body and the second body to move the first body and the second body between a process location and an open location;
an interval state detection unit configured to detect an interval state between a side wall of the first body and a side wall of the second body when the first body and the second body are placed in the process location; and
a controller configured to control the driver and the interval state detection unit,
wherein the interval state detection unit includes:
a pressure provision line configured to provide a positive pressure or a negative pressure between the side wall of the first body and the side wall of the second body; and
a pressure measurement member configured to measure a change in a pressure of the pressure provision line, and
wherein the controller determines whether or not the interval state is defective on the basis of the pressure measured by the pressure measurement member.
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