US 12,230,510 B2
Substrate treating apparatus and method for the same
Byoung Doo Choi, Chungcheongnam-do (KR); and Jin Ho Choi, Incheon (KR)
Assigned to SEMES CO., LTD., Cheonan-si (KR)
Filed by SEMES CO., LTD., Chungcheongnam-do (KR)
Filed on Dec. 31, 2021, as Appl. No. 17/566,874.
Claims priority of application No. 10-2020-0189124 (KR), filed on Dec. 31, 2020.
Prior Publication US 2022/0205100 A1, Jun. 30, 2022
Int. Cl. H01L 21/47 (2006.01); H01L 21/67 (2006.01)
CPC H01L 21/47 (2013.01) [H01L 21/67023 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A substrate treating apparatus comprising:
a treating container having a treatment space to treat a substrate;
a standby port positioned at one side of the treating container to allow a nozzle, which discharges a treatment liquid, to stand by; and
a liquid supplying unit having the nozzle and moving between the treating container and the standby port,
wherein the standby port includes:
a nozzle receiving member including a nozzle cleaning unit having a receiving space formed inside the nozzle cleaning unit to receive the nozzle, and a cleaning liquid; and
a discharge part having a discharge port provided at one side of the nozzle cleaning unit to discharge the cleaning liquid to the nozzle,
wherein the discharge port is provided to overlap at least a portion of the nozzle when viewed from above,
wherein the nozzle receiving member includes an anti-movement groove extending in a bottom surface of the nozzle receiving member, and
wherein the anti-movement groove extends along a circumference of the nozzle cleaning unit to prevent the cleaning liquid from moving left or right when the cleaning liquid is drained.