US 12,230,484 B2
Plasma processing apparatus and plasma processing method
Atsushi Harikai, Osaka (JP); and Shogo Okita, Hyogo (JP)
Assigned to PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD., Osaka (JP)
Filed by Panasonic Intellectual Property Management Co., Ltd., Osaka (JP)
Filed on Oct. 3, 2022, as Appl. No. 17/937,512.
Claims priority of application No. 2021-168353 (JP), filed on Oct. 13, 2021; and application No. 2021-168354 (JP), filed on Oct. 13, 2021.
Prior Publication US 2023/0114557 A1, Apr. 13, 2023
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32733 (2013.01) [H01J 37/32724 (2013.01); H01J 2237/3341 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A plasma processing apparatus for performing a plasma processing on a substrate held on a conveying carrier having a frame and a holding sheet, the plasma processing apparatus comprising:
a chamber;
a plasma generation unit configured to generate a plasma in the chamber;
a stage for placing the conveying carrier, the stage provided in the chamber;
a cover for covering at least part of the conveying carrier placed on the stage;
an imaging unit configured to image the conveying carrier placed on the stage;
a relative position change unit capable of changing a relative distance between the cover and the stage to a first distance and to a second distance smaller than the first distance;
a determination unit configured to determine a placed state of the conveying carrier; and
a control unit configured to control the plasma generation unit and the relative position change unit, wherein
the determination unit determines the placed state of the conveying carrier, based on an image data acquired by the imaging unit while the distance between the cover and the stage is the first distance, and
the plasma processing is performed while the distance between the cover and the stage is the second distance.
 
5. A plasma processing method, comprising:
a placement step of placing a substrate held on a conveying carrier having a frame and a holding sheet, on a stage provided in a plasma processing apparatus, the plasma processing apparatus including a chamber, a plasma generation unit configured to generate a plasma in the chamber, the stage for placing the conveying carrier, and a cover for covering at least part of the conveying carrier placed on the stage; and
a determination step of determining a placed state of the conveying carrier while a distance between the cover and the stage is a first distance, wherein
when the placed state is determined as being a first state in the determination step,
the distance between the cover and the stage is changed to a second distance smaller than the first distance, and then, a plasma is generated in the chamber, to perform a plasma processing by irradiating the generated plasma to the substrate, and wherein
the determination step includes an imaging step of imaging the conveying carrier placed on the stage while the distance between the cover and the stage is the first distance, and
the placed state is determined based on an image data acquired in the imaging step.