US 12,230,481 B2
Plasma reactor having array of coaxial multiple pins and processing low temperature plasma at high efficiency
Qi Qiu, Hangzhou (CN); Pengfei Wang, Hangzhou (CN); Jiahong Fu, Hangzhou (CN); Xingliang Liu, Hangzhou (CN); and Zhaozhe Deng, Hangzhou (CN)
Assigned to HANGZHOU CITY UNIVERSITY, Hangzhou (CN)
Filed by HANGZHOU CITY UNIVERSITY, Hangzhou (CN)
Filed on Feb. 13, 2023, as Appl. No. 18/167,897.
Claims priority of application No. 202210747101.X (CN), filed on Jun. 29, 2022.
Prior Publication US 2024/0006162 A1, Jan. 4, 2024
Int. Cl. H01J 37/32 (2006.01); G01R 1/04 (2006.01)
CPC H01J 37/32458 (2013.01) [G01R 1/0458 (2013.01); H01J 37/32568 (2013.01); H01J 37/32642 (2013.01); H01J 37/32743 (2013.01); H01J 37/32899 (2013.01); H01J 37/32935 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A plasma reactor that has an array of coaxial multiple pins, configured to process low temperature plasma, comprising: a rotating reactor, a fixed reactor, and a master tube;
wherein an end of the master tube is connected to two branched tubes, an end of one of the two branched tubes is connected to the rotating reactor, and an end of the other one of the two branched tubes is connected to the fixed reactor;
the master tube is arranged with a flow detector, and an electric three-way ball valve is arranged at connection between the master tube and the two branched tubes;
when a flow rate of inlet gas entering the master tube is less than a preset threshold defined by the flow detector, all the inlet gas is capable of entering the rotating reactor from the branched tube connected to the rotating reactor and is capable of being processed by the rotating reactor;
when the flow rate of the inlet gas entering the master tube is greater than the preset threshold of the flow detector, the electric three-way ball valve is configured to operate to allow a part of the inlet gas that exceeds the preset threshold to enter the fixed reactor from the branched tube connected to the fixed reactor and to be processed by the fixed reactor;
a rotating blade is arranged on an inner electrode of the rotating reactor, when the flow rate of the inlet gas reaches a certain value, the inlet gas is configured to generate sufficient thrust on fan blades of the rotating blade to drive the rotating blade to rotate, a plurality of discharging pins arranged on a surface of the inner electrode of the rotating reactor are driven to rotate, a discharging treatment area of the discharging pins is expanded;
an inner electrode of the fixed reactor is fixedly arranged, a front guide ring is arranged in front of a plurality of discharging pins of the inner electrode of the fixed reactor, the front guide ring radially defines a plurality of grooves, the plurality of grooves are aligned with the plurality of discharging pins.