US 12,230,476 B2
Integrated control of a plasma processing system
Gideon Van Zyl, Fort Collins, CO (US); and Thomas Joel Blackburn, Fort Collins, CO (US)
Assigned to Advanced Energy Industries, Inc., Denver, CO (US)
Filed by Advanced Energy Industries, Inc., Fort Collins, CO (US)
Filed on Feb. 22, 2021, as Appl. No. 17/181,382.
Application 17/181,382 is a continuation in part of application No. 17/031,027, filed on Sep. 24, 2020, granted, now 11,264,209.
Application 17/031,027 is a continuation of application No. 16/194,125, filed on Nov. 16, 2018, granted, now 10,811,227, issued on Oct. 20, 2020.
Claims priority of provisional application 62/588,255, filed on Nov. 17, 2017.
Prior Publication US 2021/0202209 A1, Jul. 1, 2021
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32146 (2013.01) [H01J 37/32183 (2013.01); H01J 37/32357 (2013.01); H01J 37/32697 (2013.01); H01J 2237/332 (2013.01); H01J 2237/334 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A power control system of a power delivery system comprising:
a first sensor configured to provide measurements indicative of an impedance seen by a first modulating supply, wherein the first modulating supply is configured to provide power to a plasma via a match network;
a second modulating supply configured to provide a waveform that periodically affects an impedance seen by the first modulating supply; and
a controller in communication with the first sensor, the first modulating supply and the second modulating supply, the controller configured to:
synchronize the measurements indicative of the impedance seen by the first modulating supply with the waveform of the second modulating supply to mitigate against misleading measurements;
manage tuning of the first modulating supply and the match network, where the tuning accounts for the power output of the first modulating supply and the measurements indicative of the impedance seen by the first modulating supply.