US 12,230,473 B2
Temperature-controlled surface with a cryo-nanomanipulator for improved deposition rate
Yehuda Zur, Tel-Aviv (IL)
Assigned to Applied Materials Israel Ltd., Rehovot (IL)
Filed by Applied Materials Israel Ltd., Rehovot (IL)
Filed on Jul. 26, 2021, as Appl. No. 17/385,459.
Prior Publication US 2023/0023396 A1, Jan. 26, 2023
Int. Cl. H01J 37/317 (2006.01); C23C 16/16 (2006.01); C23C 16/48 (2006.01); H01J 37/147 (2006.01); H01J 37/20 (2006.01); H01J 37/28 (2006.01); H01L 21/285 (2006.01)
CPC H01J 37/3178 (2013.01) [C23C 16/16 (2013.01); C23C 16/486 (2013.01); H01J 37/1474 (2013.01); H01J 37/20 (2013.01); H01J 37/28 (2013.01); H01L 21/28568 (2013.01); H01J 2237/002 (2013.01); H01J 2237/20285 (2013.01); H01J 2237/31732 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of depositing material over a sample in a deposition region of the sample with a charged particle beam column, the method comprising:
positioning a sample within a vacuum chamber such that the deposition region is under a field of view of the charged particle beam column;
cooling the deposition region by contacting the sample with a cryo-nanomanipulator tool in an area adjacent to the deposition region; and
while the deposition region is cooled with the cryo-nanomanipulator tool:
injecting a deposition precursor gas into the vacuum chamber at a location adjacent to the deposition region;
generating a charged particle beam with a charged particle beam column and focusing the charged particle beam on the sample; and
scanning the charged particle beam across the deposition region of the sample to activate molecules of the deposition gas that have adhered to the sample surface in the deposition region and deposit material on the sample within the deposition region.