US 12,230,471 B2
Ion milling device
Shota Aida, Tokyo (JP); Hisayuki Takasu, Tokyo (JP); Atsushi Kamino, Tokyo (JP); and Hitoshi Kamoshida, Tokyo (JP)
Assigned to Hitachi High-Tech Corporation, Tokyo (JP)
Appl. No. 17/788,556
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
PCT Filed Dec. 24, 2019, PCT No. PCT/JP2019/050524
§ 371(c)(1), (2) Date Jun. 23, 2022,
PCT Pub. No. WO2021/130842, PCT Pub. Date Jul. 1, 2021.
Prior Publication US 2023/0048299 A1, Feb. 16, 2023
Int. Cl. H01J 37/24 (2006.01); H01J 37/08 (2006.01); H01J 37/244 (2006.01); H01J 37/30 (2006.01); H01J 37/305 (2006.01)
CPC H01J 37/244 (2013.01) [H01J 37/08 (2013.01); H01J 37/305 (2013.01); H01J 2237/024 (2013.01); H01J 2237/24564 (2013.01)] 10 Claims
OG exemplary drawing
 
1. An ion milling apparatus comprising:
an ion source;
a sample stage on which a sample processed by radiating a non-convergent ion beam from the ion source is placed;
a measurement member holding section that holds a linear ion beam current measurement member extending in a first direction;
a drive unit that moves the measurement member holding section holding the ion beam current measurement member along a track extending in a second direction orthogonal to the first direction and located between the ion source and the sample stage;
an electrode that is disposed near the track; and
a controller, wherein
the controller applies a predetermined positive voltage to the electrode, moves the ion beam current measurement member within a radiation range of the ion beam by the driving unit in a state in which the ion beam is output from the ion source under a first radiation condition, and measures an ion beam current flowing through the ion beam current measurement member when the ion beam is radiated to the ion beam current measurement member.