US 12,230,413 B2
Electron beam generator, electron beam emission device and X-ray emission device
Dai Haraguchi, Hamamatsu (JP); and Yoshito Hasegawa, Hamamatsu (JP)
Assigned to HAMAMATSU PHOTONICS K.K., Hamamatsu (JP)
Appl. No. 17/917,982
Filed by HAMAMATSU PHOTONICS K.K., Hamamatsu (JP)
PCT Filed Jan. 28, 2021, PCT No. PCT/JP2021/003089
§ 371(c)(1), (2) Date Oct. 10, 2022,
PCT Pub. No. WO2021/210238, PCT Pub. Date Oct. 21, 2021.
Claims priority of application No. 2020-071471 (JP), filed on Apr. 13, 2020.
Prior Publication US 2023/0147125 A1, May 11, 2023
Int. Cl. G21K 5/04 (2006.01); H01J 1/13 (2006.01)
CPC G21K 5/04 (2013.01) [H01J 1/13 (2013.01)] 12 Claims
OG exemplary drawing
 
1. An electron beam generation source comprising:
an electron discharge part extending on a desired axis and configured to discharge electrons;
a support part electrically connected to a power supply device that supplies electric power to the electron discharge part;
a tension holding part connected between one end of the electron discharge part and the support part and configured to hold tension of the electron discharge part with a pressing force or a tensile force;
a power supply path part having one end electrically connected to the support part and the other end electrically connected to the one end of the electron discharge part; and
a movable part configured to connect the one end of the electron discharge part and one end of the tension holding part and to be movable along the desired axis,
wherein the other end of the tension holding part is connected to the support part, and the other end of the power supply path part and the one end of the tension holding part are connected to the movable part, and
wherein an electric resistance value of the tension holding part is larger than an electric resistance value of the power supply path part.