CPC G11B 5/4873 (2013.01) [G11B 5/4806 (2013.01); G11B 5/483 (2015.09); G11B 5/596 (2013.01); H10N 30/045 (2023.02); H10N 30/063 (2023.02); H10N 30/067 (2023.02); H10N 30/072 (2023.02); G11B 5/5552 (2013.01); Y10T 29/42 (2015.01)] | 11 Claims |
1. A method of manufacturing a piezoelectric microactuator assembly, the method comprising:
forming a top electrode layer onto a first face of a PZT element;
placing at least two separate portions of a mask at different locations over a top surface of the top electrode layer;
applying a constraint layer over the mask, wherein the constraint layer is smaller than the top electrode layer formed on the PZT element;
removing the mask and leaving the constraint layer, exposing at least two portions of the top electrode and creating an exposed shelf from any of the at least two exposed portions of the top electrode that are uncovered by the constraint layer;
forming a bottom electrode layer onto a bottom face of the PZT element opposite the top electrode layer; and
polarizing the PZT element to form an active piezoelectric layer.
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