US 12,229,936 B2
Super resolution SEM image implementing device and method thereof
Ho Joon Lee, Goyang-si (KR); Il Kwon Kim, Hwaseong-si (KR); Sang Gul Park, Hwaseong-si (KR); Chang Wook Jeong, Hwaseong-si (KR); Moon Hyun Cha, Yongin-si (KR); and Sat Byul Kim, Seoul (KR)
Assigned to Samsung Electronics Co., Ltd., Gyeonggi-do (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Apr. 15, 2022, as Appl. No. 17/721,616.
Claims priority of application No. 10-2021-0102440 (KR), filed on Aug. 4, 2021; and application No. 10-2021-0131782 (KR), filed on Oct. 5, 2021.
Prior Publication US 2023/0043089 A1, Feb. 9, 2023
Int. Cl. G06T 7/00 (2017.01); G06T 1/00 (2006.01); G06T 3/40 (2024.01); G06T 3/4053 (2024.01); G06T 5/00 (2024.01); G06T 5/20 (2006.01); G06T 5/70 (2024.01); G06T 11/00 (2006.01)
CPC G06T 7/0004 (2013.01) [G06T 1/0007 (2013.01); G06T 3/4053 (2013.01); G06T 5/20 (2013.01); G06T 5/70 (2024.01); G06T 11/00 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A super resolution scanning electron microscope (SEM) image implementing device comprising:
a processor configured to execute machine-readable instructions to cause the device to crop a low resolution SEM image to generate a first cropped image and a second cropped image, the low resolution SEM image including an image of at least one of fins of a semiconductor device, shallow trench isolations of the semiconductor device, or gate lines of the semiconductor device,
to upscale the first cropped image and the second cropped image to generate a first upscaled image and a second upscaled image using a ground truth image having high-resolution and corresponding to the first and second cropped image, respectively, and
to cancel noise from the first upscaled image and the second upscaled image to generate a first noise canceled image and a second noise canceled image, wherein
the noise canceling includes canceling noise based on a deep learning network trained on a layout of the semiconductor device, the layout corresponding to a field of view of the SEM image.