US 12,228,863 B2
EUV light source contamination monitoring system
Cheng Hung Tsai, Hsinchu (TW); Sheng-Kang Yu, Hsinchu (TW); Heng-Hsin Liu, Hsinchu (TW); Li-Jui Chen, Hsinchu (TW); and Shang-Chieh Chien, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on Apr. 12, 2023, as Appl. No. 18/133,948.
Prior Publication US 2024/0345491 A1, Oct. 17, 2024
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/7085 (2013.01) [G03F 7/70533 (2013.01); G03F 7/70858 (2013.01); G03F 7/70925 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system of an EUV light source, the system comprising:
a first temperature sensor inserted into a space surrounded by a plurality of vanes through a vane of the plurality of vanes and configured to obtain a first temperature in the space, wherein the first temperature decreases as a function of tin (Sn) contamination coating on an inserted portion of the first temperature sensor; and
a second temperature sensor embedded in the vane and configured to detect a second temperature in the vane; and
a signal processor configured to make a comparison between the second temperature and the first temperature and to determine an excess tin debris deposition based on a result of the comparison.