US 12,228,860 B2
Compound, polymer, pattern forming material, pattern forming method, and method of manufacturing semiconductor device
Norikatsu Sasao, Kawasaki Kanagawa (JP); Koji Asakawa, Kawasaki Kanagawa (JP); and Shinobu Sugimura, Yokohama Kanagawa (JP)
Assigned to Kioxia Corporation, Tokyo (JP)
Filed by Kioxia Corporation, Tokyo (JP)
Filed on Sep. 13, 2023, as Appl. No. 18/466,668.
Application 18/466,668 is a continuation of application No. 17/196,988, filed on Mar. 9, 2021, granted, now 11,796,915.
Claims priority of application No. 2020-157383 (JP), filed on Sep. 18, 2020.
Prior Publication US 2024/0004298 A1, Jan. 4, 2024
Int. Cl. C07C 69/78 (2006.01); C08F 12/22 (2006.01); G03F 7/11 (2006.01); H01L 21/027 (2006.01); H01L 21/311 (2006.01); H10B 41/27 (2023.01); H10B 43/27 (2023.01)
CPC G03F 7/11 (2013.01) [C07C 69/78 (2013.01); C08F 12/22 (2013.01); H01L 21/0271 (2013.01); H01L 21/31116 (2013.01); H01L 21/31144 (2013.01); H10B 41/27 (2023.02); H10B 43/27 (2023.02)] 4 Claims
OG exemplary drawing
 
1. A polymer including a monomer unit represented by the following general formula (3),

OG Complex Work Unit Chemistry
where, in the general formula (3), R1 is a hydrogen atom or a methyl group, R2s are independently a C2-14 hydrocarbon group in which a carbon is a primary carbon, secondary carbon or tertiary carbon, Q is a single bond, a C1-20 hydrocarbon group in which the hydrogen atom may be substituted by a halogen atom, or an organic group containing an oxygen atom, a nitrogen atom, or a sulfur atom between carbon-carbon atoms or at a bond terminal of a C1-20 hydrocarbon group in which the hydrogen atom may be substituted by a halogen atom, and X and Y are independently a hydrogen atom or a C1-4 hydrocarbon group, at least one of X and Y being the C1-4 hydrocarbon group.