US 12,228,858 B2
Coating composition for forming resist underlayer film for EUV lithography process
Jae Hwan Sim, Cheonan-si (KR); Suwoong Kim, Cheonan-si (KR); Jin Hong Park, Cheonan-si (KR); Myung Yeol Kim, Cheonan-si (KR); Yoo-Jin Ghang, Cheonan-si (KR); and Jae-Bong Lim, Cheonan-si (KR)
Assigned to DUPONT SPECIALTY MATERIALS KOREA LTD, Chungcheongnam-Do (KR)
Filed by ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD., Cheonan-si (KR)
Filed on Oct. 31, 2018, as Appl. No. 16/176,245.
Prior Publication US 2020/0133126 A1, Apr. 30, 2020
Int. Cl. G03F 7/09 (2006.01); C07D 251/32 (2006.01); C08F 224/00 (2006.01); C08G 71/00 (2006.01); C08G 73/06 (2006.01); G03F 7/004 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01)
CPC G03F 7/11 (2013.01) [C07D 251/32 (2013.01); C08G 71/00 (2013.01); G03F 7/0045 (2013.01); G03F 7/091 (2013.01); G03F 7/092 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/2037 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01)] 11 Claims
 
1. An underlayer coating composition, comprising:
a polymer comprising:
repeat units derived from a monomer represented by Chemical Formula (1):

OG Complex Work Unit Chemistry
wherein,
X is a linear or branched C1 to C10 hydrocarbon group, a C1 to C10 alkoxycarbonyl group, a carboxylic acid group, or a linear or branched C1 to C10 hydroxyalkyl group optionally substituted with a C1 to C5 alkoxycarbonyl group or a C1 to C5 substituted alkoxy group;
Y is a hydrogen, a linear or branched C1 to C10 hydrocarbon group, a C1 to C10 alkoxycarbonyl group, a carboxylic acid group, or a linear or branched C1 to C10 hydroxyalkyl group optionally substituted with a C1 to C5 alkoxycarbonyl group or a C1 to C5 alkoxy group; and
Z is a linear or branched C1 to C10 hydrocarbon group, a C1 to C10 alkoxycarbonyl group, a carboxylic acid group, or a linear or branched C1 to C10 hydroxyalkyl group optionally substituted with a C1 to C5 alkoxycarbonyl group or a C1 to C5 alkoxy group,
wherein each of the C1 to C10 hydrocarbon group, the C1 to C10 alkoxycarbonyl group, and the C1 to C10 hydroxyalkyl group is optionally substituted with at least one selected from the group consisting of fluorine, chlorine, bromine, iodine, a hydroxyl group, a thiol group, a carboxylic acid group, a C1 to C5 alkyl group, a C3 to C8 cycloalkyl group, a C2 to C5 alkenyl group, a C1 to C5 alkoxy group, a C2 to C5 alkenoxy group, a C6 to C10 aryl group, a C6 to C10 aryloxy group, a C7 to C10 alkylaryl group, and a C7 to C10 alkylaryloxy group,
provided that at least one selected from X, Y, and Z is:
a linear or branched C1 to C10 hydrocarbon group substituted with at least one selected from the group consisting of a hydroxyl group, a thiol group, a carboxylic acid group, a C2 to C5 alkenyl group, a C1 to C5 alkoxy group, a C2 to C5 alkenoxy group, a C6 to C10 aryloxy group, and a C7 to C10 alkylaryloxy group,
a C1 to C10 alkoxycarbonyl group,
a carboxylic acid group, or
a linear or branched C1 to C10 hydroxyalkyl group optionally substituted with a C1 to C5 alkoxycarbonyl group or a C1 to C5 alkoxy group, and
repeat units derived from a monomer represented by Chemical Formula (3):

OG Complex Work Unit Chemistry
wherein,
K, L, and M are each independently a linear or branched C1 to C10 hydrocarbon group, a C1 to C10 alkoxycarbonyl group, a C1 to C10 alkanoyloxy group, each of which is optionally substituted with a carboxylic acid group, or a linear or branched C1 to C10 hydroxyalkyl group optionally substituted with a C1 to C5 alkoxycarbonyl group or a C1 to C5 substituted alkoxy group,
wherein each of the C1 to C10 hydrocarbon group, the C1 to C10 alkoxycarbonyl group, the C1 to C10 alkanoyloxy group, and the C1 to C10 hydroxyalkyl group is optionally substituted with at least one selected from the group consisting of fluorine, chlorine, bromine, iodine, C1 to C5 alkyl, C3 to C8 cycloalkyl, C2 to C5 alkenyl, C1 to C5 alkoxy, C2 to C5 alkenoxy, C6 to C10 aryl, C6 to C10 aryloxy, C7 to C10 alkylaryl, and C7 to C10 alkylaryloxy, and
4 to 15 wt % of a photoacid generator comprising an iodonium cation, based on total solid content of the underlayer coating composition.