| CPC G03F 7/0002 (2013.01) | 9 Claims |
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1. An imprint apparatus that performs imprint processing for forming a pattern by bringing a pattern region of a mold into contact with an imprint material on a shot region, the imprint processing being sequentially performed on each of a plurality of shot regions of a substrate, wherein the shot regions are arranged in a first axis direction and in a second axis direction perpendicular to the first direction, the imprint apparatus comprising:
a substrate driving unit including a motor for moving the substrate along the first axis direction and the second axis direction;
a plurality of gas supply ports including a first gas supply port and a second gas supply port provided at a periphery of the pattern region and configured to supply gas to a space between the pattern region and the substrate; and
at least one processor or circuit configured to function as a control unit configured to perform control to:
for a next target shot region that is arranged in the first axis direction corresponding to a previous driving direction of the substrate when a previous shot region has been moved toward directly under the pattern region along the first axis direction, move the substrate along the previous driving direction while gas is supplied from the first gas supply port when the next target region is passing the first gas supply port, until the next target shot region and the pattern region face each other, to provide a predetermined concentration of gas in the space;
for the next target shot region that is arranged in the second axis direction different from the previous driving direction of the substrate, first move the substrate along both the first axis direction and the second axis direction so that the next target shot region, the second gas supply port, and the pattern region of the mold are in line in this order from an upstream of a second driving direction along the first axis direction for moving the next target shot region toward directly under the pattern region and then move the substrate in the second driving direction of the next target shot region along the first axis direction by the substrate driving unit while gas is supplied from the second gas supply port when the next target region is passing the second gas supply port, until the next target shot region and the pattern region face each other, to provide the predetermined concentration of gas in the space; and
bring the pattern region into contact with the imprint material on the next target shot region of the substrate.
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