US 12,228,338 B2
RF treatment systems and methods
Hon Ming Chun, Lexington, MA (US); Parastoo Yaghmaee, Davis, CA (US); Nathanial G. Smalley, Cedar Rapids, IA (US); and Zakiul Kabir, Portland, OR (US)
Assigned to ZIEL EQUIPMENT, SALES AND SERVICES, INC., San Francisco, CA (US)
Filed by Ziel Equipment, Sales and Services, Inc., San Francisco, CA (US)
Filed on Aug. 20, 2021, as Appl. No. 17/445,581.
Claims priority of provisional application 63/068,852, filed on Aug. 21, 2020.
Prior Publication US 2022/0057138 A1, Feb. 24, 2022
Int. Cl. F26B 3/30 (2006.01); H05B 6/54 (2006.01); H05B 6/64 (2006.01); H05B 6/68 (2006.01); H05B 6/80 (2006.01)
CPC F26B 3/30 (2013.01) [H05B 6/54 (2013.01); H05B 6/6455 (2013.01); H05B 6/68 (2013.01); H05B 6/80 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method, comprising:
determining one or more run parameters for an RF treatment based on one or more user inputs;
starting the RF treatment, wherein starting the RF treatment includes treating a product positioned within an RF chamber with RF waves;
estimating a log kill of the product during the RF treatment; and
terminating the RF treatment responsive to the log kill reaching a log kill threshold.