US 12,227,856 B2
Protocol for the synthesis of bismuth vanadate double-layer homojunction without heteroatoms as photoelectrode
Ruiqin Zhang, Kowloon (HK); and Haipeng Wang, Kowloon (HK)
Assigned to City University of Hong Kong, Kowloon (HK)
Filed by City University of Hong Kong, Kowloon (HK)
Filed on Feb. 24, 2023, as Appl. No. 18/174,036.
Prior Publication US 2024/0295037 A1, Sep. 5, 2024
Int. Cl. C23C 28/00 (2006.01); C23C 28/02 (2006.01); C25B 1/04 (2021.01); C25B 9/50 (2021.01); C25B 11/053 (2021.01); C25B 11/077 (2021.01); C25D 3/54 (2006.01); C25D 5/10 (2006.01); C25D 5/50 (2006.01); C25D 5/54 (2006.01); C25D 7/12 (2006.01)
CPC C25B 11/053 (2021.01) [C25B 1/04 (2013.01); C25B 9/50 (2021.01); C25B 11/077 (2021.01); C25D 3/54 (2013.01); C25D 5/10 (2013.01); C25D 5/50 (2013.01); C25D 7/12 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A method for fabricating a photoelectrode comprising a double-layer homojunction comprising the steps of;
(a) depositing a bismuth precursor onto a substrate via electrodeposition in a first electrolyte;
(b) thermal evaporating a vanadium precursor onto the substrate with the bismuth precursor under ambient pressure; and
(c) cooling down the substrate to form a first layer of BiVO4 film;
(d) depositing the bismuth precursor onto the substrate of step (c) via electrodeposition in a second electrolyte;
(e) thermal evaporating the vanadium precursor onto the substrate with the bismuth precursor under ambient pressure; and
(f) cooling down the substrate to form a second layer of BiVO4 film, wherein either the first electrolyte is an acidic electrolyte and the second electrolyte is an alkaline electrolyte or the first electrolyte is an alkaline electrolyte and the second electrolyte is an acidic electrolyte.