CPC C23C 14/30 (2013.01) [C23C 14/228 (2013.01); C23C 14/243 (2013.01); C23C 14/246 (2013.01); C23C 14/505 (2013.01)] | 20 Claims |
1. A deposition apparatus (20) comprising:
a chamber (22);
a process gas source (62) coupled to the chamber;
a vacuum pump (52) coupled to the chamber;
at least two electron guns (26);
one or more power supplies (30) coupled to the electron guns;
a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and
a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H,
wherein:
the plurality of crucibles comprises a row of three crucibles; and
the standoff height H is adjustable in a range including at least a standoff height of 22 inches.
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