US 12,227,823 B2
Metal plate for producing vapor deposition masks, production method for metal plates, vapor deposition mask, production method for vapor deposition mask, and vapor deposition mask device comprising vapor deposition mask
Hiroki Oka, Tokyo (JP); Sachiyo Matsuura, Tokyo (JP); Chiaki Hatsuta, Tokyo (JP); Chikao Ikenaga, Tokyo (JP); Hideyuki Okamoto, Tokyo (JP); and Masato Ushikusa, Tokyo (JP)
Assigned to Dai Nippon Printing Co., Ltd., Tokyo (JP)
Filed by Dai Nippon Printing Co., Ltd., Tokyo (JP)
Filed on Nov. 12, 2019, as Appl. No. 16/680,942.
Claims priority of application No. PCT/JP2018/041915 (WO), filed on Nov. 13, 2018; application No. PCT/JP2018/041918 (WO), filed on Nov. 13, 2018; application No. PCT/JP2018/041919 (WO), filed on Nov. 13, 2018; and application No. 2019-090946 (JP), filed on May 13, 2019.
Prior Publication US 2020/0149139 A1, May 14, 2020
Int. Cl. C22C 38/10 (2006.01); B21B 1/22 (2006.01); C21D 6/00 (2006.01); C21D 8/02 (2006.01); C21D 9/46 (2006.01); C22C 38/08 (2006.01); C23C 2/26 (2006.01); C23C 14/04 (2006.01); C23C 14/24 (2006.01); C25D 1/04 (2006.01); C25D 3/56 (2006.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); H10K 50/11 (2023.01); H10K 59/00 (2023.01); H10K 71/00 (2023.01); H10K 71/16 (2023.01); H10K 77/10 (2023.01)
CPC C22C 38/105 (2013.01) [B21B 1/22 (2013.01); C21D 6/001 (2013.01); C21D 8/0205 (2013.01); C21D 8/0226 (2013.01); C21D 8/0247 (2013.01); C21D 9/46 (2013.01); C22C 38/08 (2013.01); C23C 2/26 (2013.01); C23C 14/042 (2013.01); C23C 14/24 (2013.01); C25D 1/04 (2013.01); C25D 3/562 (2013.01); G03F 7/0015 (2013.01); G03F 7/0027 (2013.01); G03F 7/0035 (2013.01); G03F 7/2008 (2013.01); G03F 7/2022 (2013.01); H10K 71/00 (2023.02); H10K 71/166 (2023.02); H10K 77/10 (2023.02); C21D 2201/05 (2013.01); H10K 50/11 (2023.02); H10K 59/00 (2023.02)] 14 Claims
OG exemplary drawing
 
1. A metal plate used for manufacturing a deposition mask,
wherein the metal plate is made of a rolled steel of an iron alloy containing at least nickel and has a thickness of equal to or less than 30 μm,
wherein an average cross-sectional area of crystal grains on a cross section of the metal plate is from 0.5 μm2 to 50 μm2, the cross section having an angle of from −10° to +10° with respect to a plane perpendicular to a rolling direction of the metal plate,
the average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measurement results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of equal to or more than 5 degrees is recognized as a crystal grain boundary, and wherein the metal plate has no deformed portions.