US 12,227,613 B2
Photo-patternable organic semiconductor (OSC) polymers and methods of formation and applications thereof
Mingqian He, Horseheads, NY (US); Xin Li, Shanghai (CN); Yang Li, Shanghai (CN); and Hongxiang Wang, Shanghai (CN)
Assigned to CORNING INCORPORATED, Corning, NY (US)
Filed by Corning Incorporated, Corning, NY (US)
Filed on Oct. 7, 2021, as Appl. No. 17/495,970.
Claims priority of application No. 202011108416.7 (CN), filed on Oct. 16, 2020.
Prior Publication US 2022/0119591 A1, Apr. 21, 2022
Int. Cl. C08G 61/12 (2006.01); C09D 5/24 (2006.01); C09D 165/00 (2006.01); G01N 33/00 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); H10K 10/46 (2023.01); H10K 85/10 (2023.01)
CPC C08G 61/126 (2013.01) [C09D 5/24 (2013.01); C09D 165/00 (2013.01); G01N 33/0036 (2013.01); G01N 33/0037 (2013.01); G01N 33/0054 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); H10K 10/466 (2023.02); H10K 10/488 (2023.02); H10K 85/113 (2023.02); H10K 85/151 (2023.02); C08G 2261/124 (2013.01); C08G 2261/1412 (2013.01); C08G 2261/18 (2013.01); C08G 2261/228 (2013.01); C08G 2261/3223 (2013.01); C08G 2261/3241 (2013.01); C08G 2261/3243 (2013.01); C08G 2261/41 (2013.01); C08G 2261/80 (2013.01); C08G 2261/92 (2013.01); C08G 2261/94 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A method, comprising:
reacting at least one donor group with at least one protected acceptor group to form a plurality of protecting group-containing OSC polymers;
removing the protecting group from the plurality of protecting group-containing OSC polymers to form H-bonding sites; and
fusing the H-bonding sites of a first OSC polymer backbone with H-bonding sites of a second OSC polymer backbone to form π-π interactions between conjugated OSC polymers,
wherein the at least one donor group is:

OG Complex Work Unit Chemistry
wherein LG represents a lipophilic group.