US 12,226,061 B2
Base station of cleaning device and cleaning system
Tao Sun, Suzhou (CN); Tao Zhang, Suzhou (CN); Xianmin Wei, Suzhou (CN); and Xiaogang Xuan, Suzhou (CN)
Assigned to MIDEA ROBOZONE TECHNOLOGY CO., LTD., Suzhou (CN)
Appl. No. 18/546,973
Filed by MIDEA ROBOZONE TECHNOLOGY CO., LTD., Suzhou (CN)
PCT Filed May 11, 2021, PCT No. PCT/CN2021/093162
§ 371(c)(1), (2) Date Aug. 18, 2023,
PCT Pub. No. WO2022/174522, PCT Pub. Date Aug. 25, 2022.
Claims priority of application No. 202110188043.7 (CN), filed on Feb. 18, 2021.
Prior Publication US 2024/0130597 A1, Apr. 25, 2024
Prior Publication US 2024/0225404 A9, Jul. 11, 2024
Int. Cl. A47L 11/40 (2006.01); A47L 11/24 (2006.01); A47L 11/28 (2006.01)
CPC A47L 11/4083 (2013.01) [A47L 11/24 (2013.01); A47L 11/28 (2013.01); A47L 11/4091 (2013.01); A47L 2201/026 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A base station of a cleaning device, comprising:
a base station body having an accommodating chamber for accommodating the cleaning device and an opening for the cleaning device to enter or exit the accommodating chamber; and
a water injection assembly comprising a movable base, and a movable plate, a lifting mechanism, and a water injection pipe that are disposed on the movable base, wherein the water injection pipe is configured to inject water into the cleaning device, the lifting mechanism is configured to drive the water injection pipe to move, a first elastic member is disposed between the movable plate and a side wall of the accommodating chamber, and the cleaning device is contacted with the movable plate during a water injection process of the water injection assembly.