US 11,901,167 B2
Ion beam deposition target life enhancement
Sarpangala Hariharakeshava Hegde, Fremont, CA (US); Vincent C. Lee, Fremont, CA (US); Wei-Hua Hsiao, St. Petersburg, FL (US); and Joseph Barraco, Lutz, FL (US)
Assigned to PLASMA-THERM NES LLC, St. Petersburg, FL (US)
Filed by Plasma-Therm NES LLC, St. Petersburg, FL (US)
Filed on Apr. 18, 2022, as Appl. No. 17/723,005.
Prior Publication US 2023/0335383 A1, Oct. 19, 2023
Int. Cl. C23C 14/46 (2006.01); H01J 37/34 (2006.01)
CPC H01J 37/3417 (2013.01) [C23C 14/46 (2013.01); H01J 37/3464 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for increased target utilization within a sputtering system comprising the steps of:
providing a plurality of targets, each target of the plurality of targets is operatively connected to a target holder, each target of the plurality of targets is positioned along an outer portion of a generally circular pallet of the sputtering system, the circular pallet having a central axis;
generating a first ion beam within the sputtering system;
directing the first generated ion beam at a first location of a first target;
discontinuing the generation of the first ion beam;
rotating the central axis of the circular pallet;
generating a second ion beam within the sputtering system; and
directing the second generated ion beam at a second location of said first target.