US 11,899,375 B2
Massive overlay metrology sampling with multiple measurement columns
Jonathan Madsen, Milpitas, CA (US); Andrei V. Shchegrov, Campbell, CA (US); Amnon Manassen, Haifa (IL); Andrew V. Hill, Berkeley, CA (US); Yossi Simon, Milpitas, CA (US); Gilad Laredo, Haifa (IL); and Yoram Uziel, Milpitas, CA (US)
Assigned to KLA Corporation, Milpitas, CA (US)
Filed by KLA Corporation, Milpitas, CA (US)
Filed on Mar. 24, 2021, as Appl. No. 17/210,793.
Claims priority of provisional application 63/116,163, filed on Nov. 20, 2020.
Prior Publication US 2023/0359129 A1, Nov. 9, 2023
Int. Cl. G03F 7/20 (2006.01); G03F 9/00 (2006.01); H01J 37/304 (2006.01); H01J 37/317 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70633 (2013.01) [G03F 9/7084 (2013.01); H01J 37/3045 (2013.01); H01J 37/3177 (2013.01); H01J 2237/31764 (2013.01)] 56 Claims
OG exemplary drawing
 
1. A multi-column metrology tool comprising:
two or more measurement columns distributed along a column direction, wherein the two or more measurement columns are configured to simultaneously probe two or more measurement regions on a sample including a plurality of metrology targets, wherein a particular measurement column of the two or more measurement columns comprises:
an illumination sub-system configured to direct illumination from at least one of one or more illumination sources to the sample;
a collection sub-system including a collection lens configured to collect measurement signals from the sample and direct the measurement signals to one or more detectors; and
a column-positioning sub-system configured to adjust a position of the collection lens within a lateral plane parallel to a sample plane for a measurement, wherein a measurement region of the particular measurement column is defined by a field of view of the collection lens and a range of the column-positioning sub-system in the lateral plane; and
a sample-positioning sub-system configured to scan the sample along a scan path different than the column direction, wherein the scan path positions metrology targets of the plurality of metrology targets within the measurement regions of the two or more measurement columns for measurements, wherein the column-positioning sub-systems of the two or more measurement columns position the collection lenses of the two or more measurement columns to align the metrology targets in the measurement regions along the scan path to fields of view of the collection lenses for the measurements.