US 11,899,372 B2
Optical device, exposure device, method for manufacturing flat panel display, and method for manufacturing device
Yasushi Mizuno, Saitama (JP); and Masaki Kato, Yokohama (JP)
Assigned to NIKON CORPORATION, Tokyo (JP)
Filed by NIKON CORPORATION, Tokyo (JP)
Filed on Jul. 7, 2022, as Appl. No. 17/859,140.
Application 17/859,140 is a continuation of application No. PCT/JP2021/000578, filed on Jan. 8, 2021.
Claims priority of provisional application 62/959,178, filed on Jan. 10, 2020.
Prior Publication US 2023/0004094 A1, Jan. 5, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70191 (2013.01) 19 Claims
OG exemplary drawing
 
1. An exposure device configured to expose a substrate, the exposure device comprising:
a first light source;
a plurality of spatial light modulators each of which is configured to spatially modulate an incident beam based on pattern data; and
an optical path switching machine configured to switch an optical path of light from the first light source so as to sequentially guide the light to the plurality of spatial light modulators,
wherein the optical path switching machine comprises:
a first switching machine configured to switch the optical path to one of a first optical path and a second optical path; and
a second switching machine (i) that is configured to guide the light guided to the first optical path by the first switching machine to spatial light modulators of a first group among the plurality of spatial light modulators and (ii) that is configured to guide the light guided to the second optical path by the first switching machine to spatial light modulators of a second group among the plurality of spatial light modulators.