US 11,899,365 B2
Photosensitive siloxane composition and pattern forming method using the same
Naofumi Yoshida, Yokohama (JP); Takashi Fuke, Kakegawa (JP); Megumi Takahashi, Kakegawa (JP); Katsuto Taniguchi, Kakegawa (JP); and Toshiaki Nonaka, Tokyo (JP)
Assigned to Merck Patent GmbH, Darmstadt (DE)
Appl. No. 16/958,866
Filed by Merck Patent GmbH, Darmstadt (DE)
PCT Filed Dec. 27, 2018, PCT No. PCT/EP2018/097012
§ 371(c)(1), (2) Date Jun. 29, 2020,
PCT Pub. No. WO2019/129802, PCT Pub. Date Jul. 4, 2019.
Claims priority of application No. 2017-254505 (JP), filed on Dec. 28, 2017.
Prior Publication US 2021/0055657 A1, Feb. 25, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/075 (2006.01); C08G 77/00 (2006.01); G03F 7/40 (2006.01)
CPC G03F 7/0757 (2013.01) [C08G 77/80 (2013.01); G03F 7/40 (2013.01)] 20 Claims
 
1. A photosensitive siloxane composition comprising:
a polysiloxane (Pa)
which contains a repeating unit represented by the following formula (ia):

OG Complex Work Unit Chemistry
wherein
R is hydrogen, a monovalent to trivalent, linear, branched or cyclic, saturated or unsaturated C1-30 aliphatic hydrocarbon group, or a monovalent to trivalent C6-30 aromatic hydrocarbon group, in said aliphatic hydrocarbon group and said aromatic hydrocarbon group, one or more methylene are unsubstituted or substituted with oxy, imide or carbonyl, one or more hydrogens are unsubstituted or substituted with fluorine, hydroxy or alkoxy, or one or more carbons are unsubstituted or substituted with silicon,
when R is divalent or trivalent, R connects Si atoms contained in a plurality of repeating units, and all or part of said repeating units form a structure represented by the following formula (ia′):

OG Complex Work Unit Chemistry
wherein
L is —(CR′2)n— or

OG Complex Work Unit Chemistry
provided that
n is an integer of 1 to 3, and
each R′ is independently hydrogen, methyl or ethyl;
a photoactive agent; and
a solvent.