US 11,899,362 B2
Imprint apparatus, imprint method, and article manufacturing method
Yosuke Murakami, Tochigi (JP); and Kazuki Nakagawa, Tochigi (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Dec. 19, 2022, as Appl. No. 18/067,974.
Claims priority of application No. 2022-001285 (JP), filed on Jan. 6, 2022.
Prior Publication US 2023/0213854 A1, Jul. 6, 2023
Int. Cl. G03F 7/00 (2006.01); G03F 9/00 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/0002 (2013.01) [G03F 7/2022 (2013.01); G03F 9/7042 (2013.01)] 12 Claims
OG exemplary drawing
 
1. An imprint apparatus that performs an imprint process including aligning a substrate and a mold in a state in which the mold is in contact with an imprint material on the substrate and curing the imprint material by light irradiation after the aligning, the apparatus comprising:
a control unit configured to determine a first exposure amount of a first light irradiation and a second exposure amount of a second light irradiation such that a viscosity resistance of the imprint material in a pattern region of the substrate after the first light irradiation and the second light irradiation does not exceed a first threshold;
a first irradiation unit configured to perform the first light irradiation of the imprint material on the substrate to incompletely cure the imprint material in the pattern region before bringing the mold into contact with the imprint material on the substrate for the aligning;
a second irradiation unit configured to perform the second light irradiation of the imprint material on the substrate to further incompletely cure the imprint material in the pattern region, in the aligning; and
a third irradiation unit configured to perform third light irradiation of the imprint material on the substrate to completely cure the imprint material in the pattern region, in the curing.