US 11,899,198 B2
Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems
Thomas L. Laidig, Richmond, CA (US); Christopher Bencher, Cupertino, CA (US); Hwan J. Jeong, Los Altos, CA (US); and Uwe Hollerbach, Fremont, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on May 23, 2022, as Appl. No. 17/750,751.
Prior Publication US 2023/0408807 A1, Dec. 21, 2023
Int. Cl. G03F 7/20 (2006.01); G02B 26/08 (2006.01); G03F 7/00 (2006.01); G02B 27/30 (2006.01)
CPC G02B 26/0833 (2013.01) [G02B 27/30 (2013.01); G03F 7/70258 (2013.01); G03F 7/70575 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A digital lithography system comprising:
a first spatial light modulator pixel configured to direct a first light beam onto a substrate during a digital lithography process;
a second spatial light modulator pixel configured to direct a second light beam onto the substrate during the digital lithography process;
a light source configured to generate the first light beam, wherein the first light beam comprises a plurality of components comprising:
a first component having a first wavelength that generates a first phase shift that is greater than a preselected phase shift; and
a second component having a second wavelength that generates a second phase shift that is less than the preselected phase shift; and
a controller configured to control intensities of the plurality of components to generate an effect on the substrate that approximates the preselected phase shift.