US 11,898,968 B2
Inspection apparatus adjustment system and inspection apparatus adjustment method
Taichi Maeda, Tokyo (JP); and Yuko Sasaki, Tokyo (JP)
Assigned to Hitachi High-Tech Corporation, Tokyo (JP)
Appl. No. 17/594,804
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
PCT Filed May 15, 2019, PCT No. PCT/JP2019/019274
§ 371(c)(1), (2) Date Oct. 29, 2021,
PCT Pub. No. WO2020/230286, PCT Pub. Date Nov. 19, 2020.
Prior Publication US 2022/0252525 A1, Aug. 11, 2022
Int. Cl. G01N 21/95 (2006.01); G06T 7/00 (2017.01); G01N 23/2251 (2018.01)
CPC G01N 21/9501 (2013.01) [G01N 23/2251 (2013.01); G06T 7/0004 (2013.01); G01N 2223/6116 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01)] 15 Claims
OG exemplary drawing
 
1. An inspection apparatus adjustment system that adjusts an inspection apparatus which inspects samples,
wherein an analysis result database that stores, for each sample, an inspection apparatus model indicating a model of an inspection apparatus, a sample model indicating a model of a sample, a focus point indicating a location where the inspection apparatus focuses on the sample, and an analysis result including a sample image of the sample and an optical condition of the sample in the inspection apparatus is available, and
the inspection apparatus adjustment system includes
receiver an inspection sample image indicating an image of a sample to be inspected from the inspection apparatus;
searcher for an analysis result having a sample image similar to the received inspection sample image from the analysis result database;
extractor an optical condition included in the searched analysis result; and
outputter the extracted optical condition.