US 11,898,238 B2
Shielding device and thin-film-deposition equipment with the same
Jing-Cheng Lin, Hsinchu County (TW); and Yu-Te Shen, Hsinchu County (TW)
Assigned to SKY TECH INC., Hsinchu County (TW)
Filed by SKY TECH INC., Hsinchu County (TW)
Filed on Oct. 5, 2021, as Appl. No. 17/494,017.
Claims priority of application No. 100123821 (TW), filed on Jun. 29, 2021.
Prior Publication US 2022/0411917 A1, Dec. 29, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/34 (2006.01); C23C 14/56 (2006.01); C23C 14/02 (2006.01)
CPC C23C 14/564 (2013.01) [C23C 14/021 (2013.01); H01J 37/3441 (2013.01); H01J 37/3447 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A thin-film-deposition equipment, comprising:
a reaction chamber comprising a containing space;
a carrier disposed within the containing space for carrying at least one substrate thereon; and
a shielding device comprising:
a first-shield member that is disposed within the containing space and that has a first-inner-edge surface disposed with at least one protrusion;
a second-shield member that is disposed within the containing space and that has a second-inner-edge surface disposed with at least one cavity corresponding to the at least one protrusion of the first-inner-edge surface of the first-shield member; and
a driver that interconnects and drives the first-shield member and the second-shield member to respectively sway in opposite directions between an open state and a shielding state, wherein in the shielding state, the first-inner-edge surface of the first-shield member and the second-inner-edge surface of the second-shield member are adjacent to each other with the at least one protrusion of the first-shield member entering the at least one cavity of the second-shield member, such that the first-shield member and the second-shield member together cover the carrier.