US 11,898,123 B2
Cleaning compositions
Emil A. Kneer, Mesa, AZ (US); Thomas Dory, Gilbert, AZ (US); and Atsushi Mizutani, Shizuoka (JP)
Assigned to Fujifilm Electronic Materials U.S.A., Inc., N. Kingstown, RI (US)
Filed by Fujifilm Electronic Materials U.S.A., Inc., N. Kingstown, RI (US)
Filed on Aug. 27, 2021, as Appl. No. 17/458,671.
Claims priority of provisional application 63/152,486, filed on Feb. 23, 2021.
Claims priority of provisional application 63/070,886, filed on Aug. 27, 2020.
Prior Publication US 2022/0064575 A1, Mar. 3, 2022
Int. Cl. C11D 7/32 (2006.01); C11D 3/33 (2006.01); C11D 3/00 (2006.01); C11D 3/28 (2006.01); C11D 11/00 (2006.01); C11D 3/43 (2006.01); C11D 3/34 (2006.01)
CPC C11D 3/33 (2013.01) [C11D 3/0047 (2013.01); C11D 3/0073 (2013.01); C11D 3/28 (2013.01); C11D 3/3409 (2013.01); C11D 3/43 (2013.01); C11D 11/0047 (2013.01)] 39 Claims
OG exemplary drawing
 
1. A cleaning composition, comprising:
1) At least one redox agent;
2) At least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid;
3) At least one corrosion inhibitor, wherein the at least one corrosion inhibitor comprises 5-methyl-1H-benzotriazole;
4) At least one sulfonic acid; and
5) water.