US 11,897,757 B1
MEMS resonator with beam segments having predefined angular offset to each other and to resonator silicon crystal orientation
Renata M. Berger, Palo Alto, CA (US); Ginel C. Hill, Sunnyvale, CA (US); Paul M. Hagelin, Saratoga, CA (US); Charles I. Grosjean, Los Gatos, CA (US); Aaron Partridge, Cupertino, CA (US); Joseph C. Doll, Mountain View, CA (US); and Markus Lutz, Mountain View, CA (US)
Assigned to SiTime Corporation, Santa Clara, CA (US)
Filed by SiTime Corporation, Santa Clara, CA (US)
Filed on Jul. 23, 2021, as Appl. No. 17/384,535.
Application 17/384,535 is a division of application No. 15/627,049, filed on Jun. 19, 2017.
Application 15/627,049 is a division of application No. 13/759,013, filed on Feb. 4, 2013, granted, now 9,695,036, issued on Jul. 4, 2017.
Claims priority of provisional application 61/617,230, filed on Mar. 29, 2012.
Claims priority of provisional application 61/594,357, filed on Feb. 2, 2012.
Int. Cl. B81B 3/00 (2006.01); H03H 9/02 (2006.01); H03H 9/24 (2006.01)
CPC B81B 3/0024 (2013.01) [H03H 9/02448 (2013.01); H03H 9/2405 (2013.01)] 23 Claims
OG exemplary drawing
 
1. A micromachined resonator comprising:
a first structure formed from a silicon wafer having a crystallographic orientation, the first structure having a length extending along a first axis, the first axis having a predetermined angular offset from the crystallographic orientation, the first structure to move in resonant motion; and
a second structure also formed from the silicon wafer, the second structure having a length extending along a second axis, the second axis having a predetermined angular offset from each of the first axis and the crystallographic orientation, the second structure to move in resonant motion;
wherein the predetermined angular offset of the second axis from the crystallographic orientation is less than forty-five degrees and is the negative of the predetermined angular offset of the first axis from the crystallographic orientation; and
wherein the first structure and the second structures are structurally coupled, wherein a resonant frequency of the micromachined resonator is dependent on the first structure and the second structure, and wherein the first structure and the second structure each include an impurity dopant having concentration which is greater than 1019 cm−3.