US 11,896,204 B2
Methods and systems for providing plasma treatments to optical surfaces
Adam Sagiv, Moshav Bnei Atarot (IL); and Amnon Lam, Kibutz Givat Oz (IL)
Assigned to PLASMATICA LTD., Moshav Bnei Atarot (IL)
Filed by PLASMATICA LTD., Salit (IL)
Filed on Apr. 22, 2022, as Appl. No. 17/660,398.
Application 17/660,398 is a continuation in part of application No. 17/573,130, filed on Jan. 11, 2022.
Application 17/573,130 is a continuation of application No. 16/539,851, filed on Aug. 13, 2019, granted, now 11,246,480, issued on Feb. 15, 2022.
Application 16/539,851 is a continuation in part of application No. 15/757,659, granted, now 10,413,168, issued on Sep. 17, 2019, previously published as PCT/IL2016/050990, filed on Sep. 7, 2016.
Claims priority of provisional application 63/178,024, filed on Apr. 22, 2021.
Claims priority of provisional application 62/215,061, filed on Sep. 7, 2015.
Claims priority of application No. 288770 (IL), filed on Dec. 7, 2021.
Prior Publication US 2022/0257105 A1, Aug. 18, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. A61B 1/12 (2006.01); G02B 1/18 (2015.01); H05H 1/24 (2006.01); G02B 27/00 (2006.01); A61L 2/14 (2006.01)
CPC A61B 1/127 (2013.01) [G02B 1/18 (2015.01); G02B 27/0006 (2013.01); H05H 1/2406 (2013.01); A61L 2/14 (2013.01); A61L 2202/24 (2013.01); H05H 2245/30 (2021.05)] 15 Claims
OG exemplary drawing
 
1. A device for inhibiting condensation distortion on an optical element, the device comprising:
a housing;
a chamber within the housing, the chamber being configured to accommodate a dielectric barrier at least partially therein;
electrical circuitry in the housing, the electrical circuitry including a plurality of electric conductors;
a plasma activation region associated with the chamber and being configured to retain the optical element in a manner exposing an optical surface of the optical element thereof to the plasma activation region, wherein when the dielectric barrier is at least partially contained within the chamber:
the plasma activation region is configured to contain gas on a first side of the dielectric barrier, and
at least a first electric conductor of the electrical circuitry is configured to form an electrical connection with a first electrode located on the first side of the dielectric barrier;
a second electrode connected to at least a second electric conductor of the electrical circuitry, the second electrode being located on a second side of the dielectric barrier, opposite the plasma activation region, when the dielectric barrier is at least partially contained within the chamber; and
at least one processor configured to:
control electricity flow through the circuitry to cause an electric field associated with a voltage drop between the first electrode located on the first side of the dielectric barrier and the second electrode located on the second side of the dielectric barrier, to thereby generate plasma within the plasma activation region; and
maintain the generated plasma in the plasma activation region for a time period sufficient to cause the optical surface of the optical element to become hydrophilic.