US 12,545,842 B2
Chemical compositions and methods of using same for remediating sulfur-containing compositions and other contaminants in fluids
Cliffton Lee Roe, Harrison Township, MI (US); and Linda Schweitzer, Rochester Hills, MI (US)
Assigned to Gaps Technology, LLC, Slidell, LA (US)
Filed by GAPS Technology, LLC, Slidell, LA (US)
Filed on Oct. 23, 2023, as Appl. No. 18/382,932.
Application 18/382,932 is a division of application No. 17/857,084, filed on Jul. 4, 2022, abandoned.
Application 17/857,084 is a continuation of application No. PCT/US2022/028379, filed on May 9, 2022.
Claims priority of provisional application 63/185,808, filed on May 7, 2021.
Prior Publication US 2024/0067887 A1, Feb. 29, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. C10G 29/22 (2006.01); B01D 53/34 (2006.01); B01D 53/52 (2006.01); B01D 53/54 (2006.01); B01D 53/62 (2006.01); B01D 53/78 (2006.01); C10L 3/10 (2006.01)
CPC C10G 29/22 (2013.01) [B01D 53/526 (2013.01); B01D 53/62 (2013.01); B01D 53/78 (2013.01); C10L 3/103 (2013.01); C10L 3/104 (2013.01); C10L 3/106 (2013.01); B01D 2251/304 (2013.01); B01D 2251/306 (2013.01); B01D 2251/604 (2013.01); B01D 2251/90 (2013.01); B01D 2257/504 (2013.01); C10G 2300/202 (2013.01); C10G 2300/205 (2013.01); C10G 2300/207 (2013.01); C10L 2290/545 (2013.01)] 8 Claims
OG exemplary drawing
 
4. A treatment process for removing and/or remediating targeted contaminants in a contaminated gas, wherein the targeted contaminants are selected from a group consisting of H2S, mercaptans, thiophenes, benzene, toluene, ethylbenzene, xylenes, CO2, SO2, metals, and salts, comprising steps of: preparing a liquid treatment composition containing water, at least one hydroxide compound and a hydrocarbon based liquid, wherein a pH of the treatment composition is at least 13.0 and the aqueous solution contains at least one of sodium hydroxide and potassium hydroxide; providing a volume of the liquid treatment composition in a reaction chamber such that there is a head space above the treatment composition in the reaction chamber; and bubbling or otherwise passing a flow of the contaminated gas through the treatment composition in the reaction chamber and into the head space to cause targeted contaminants in the contaminated gas to be remediated by the liquid treatment composition.