| CPC H10K 71/00 (2023.02) [C23C 14/12 (2013.01); C23C 14/24 (2013.01); C23C 14/50 (2013.01); C23C 14/54 (2013.01); C23C 14/568 (2013.01); H10K 71/164 (2023.02); H10K 71/70 (2023.02)] | 15 Claims |

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1. A metrology system comprising:
a chamber to hold a workpiece under vacuum conditions, the chamber including a support to hold the workpiece;
a first light source to generate a first light beam that impinges a surface of the workpiece at an oblique angle to induce photoluminescence in a layer on the workpiece in the chamber;
a second light source to generate a second light beam that impinges the surface of the workpiece at a normal angle to be reflected from the layer on the workpiece;
a detector assembly including
optical components to collect on a common optical path both photoluminescent light emitted by the layer substantially normal to the surface and reflected light that is reflected from the workpiece substantially normal to the surface,
a first detector to measure an intensity of the photoluminescent light,
a second detector to measure an intensity of the reflected light, and
a beam splitter on the common optical path to direct at least a portion of the photoluminescent light to the first detector and at least a portion of the reflected light to the second detector; and
a control system configured to
receive the measured intensity of the photoluminescent light,
receive the measured intensity of the reflected light and generate a thickness measurement for the layer therefrom, and
determine a doping concentration of the layer from the thickness measurement and the measured intensity of the photoluminescent light.
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