CPC H10B 12/31 (2023.02) [G11C 5/10 (2013.01); G11C 11/401 (2013.01); G11C 11/4085 (2013.01); H01L 21/84 (2013.01); H01L 23/528 (2013.01); H01L 23/53228 (2013.01); H01L 27/0688 (2013.01); H01L 27/1207 (2013.01); H01L 28/91 (2013.01); H01L 29/7869 (2013.01); H10B 12/05 (2023.02); H10B 12/30 (2023.02); H10B 12/48 (2023.02); H10B 12/50 (2023.02)] | 6 Claims |
1. A semiconductor device comprising:
a first layer comprising a transistor;
a second layer provided over the first layer, the second layer comprising a wiring layer; and
a third layer provided over the second layer, the third layer comprising an insulating layer,
wherein a first conductive layer is provided over the first layer,
wherein part of a side surface of the first conductive layer is in contact with the second layer,
wherein a second conductive layer is provided in a first opening provided in the second layer and in a second opening provided in the third layer,
wherein a third conductive layer is provided over the second conductive layer,
wherein the second conductive layer has a region in contact with a top surface of the first conductive layer and a region in contact with the side surface of the first conductive layer,
wherein, in a cross-sectional view, the second conductive layer has a first region overlapping with the first conductive layer, a second region, and a third region,
wherein, in the cross-sectional view, the second region and the third region do not overlap with the first conductive layer and sandwich the first region,
wherein, in a plan view, the second conductive layer has a region extending from the first region along one direction, and
wherein the third conductive layer has a region in contact with a top surface of the region extending from the first region.
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