| CPC H05B 1/023 (2013.01) [H01L 21/67115 (2013.01); H01L 21/68785 (2013.01)] | 20 Claims |

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1. A substrate heating apparatus comprising:
a support shaft extending in a first direction;
a chuck stage including a central axis, wherein the chuck stage is disposed on and coupled to the support shaft;
a plurality of heating lamps disposed on the chuck stage concentrically around the central axis, wherein each of the plurality of heating lamps has a ring shape;
a window disposed on the chuck stage, the window including a window base and a central lens disposed in at least one of an upper surface or a lower surface of a central portion of the window base, wherein the central lens at least partially overlaps the support shaft in the first direction and wherein the chuck stage and the window are each configured to support a substrate above the plurality of heating lamps; and
a mirror disposed between the plurality of heating lamps and the chuck stage, the mirror including a mirror base, a central reflector disposed on the mirror base and adjacent to a heating lamp, and an edge reflector disposed on an edge portion of the mirror base and adjacent to a heating lamp, wherein the plurality of heating lamps are configured to heat the substrate by emitting first light through the window onto the substrate and emitting second light onto the mirror,
wherein the mirror is configured to reflect the second light through the window onto the substrate, including reflecting a central portion of the second light via the central reflector through the window onto a central portion of the substrate and reflecting an edge portion of the second light through the window onto an edge portion of the substrate, and
wherein the central lens is configured to focus a first portion of the first light and a first portion of the second light onto the central portion of the substrate.
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